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Atomflo™ 400D System

The Atomflo™ 400D System is used for atmospheric plasma-enhanced chemical vapor deposition (PECVD). A picture of the AH-250D source is shown below. The volatile precursor that contains the elements required in the plasma coating is fed separately to the source. The precursor and plasma gas mix together, react, and deposit the desired thin film. For example, tetraethoxysilane may be combined with an oxygen plasma to deposit glass for scratch resistance, corrosion protection, or to act as a moisture barrier. We also offer delivery systems that precisely meter the precursor vapor into the coating process. The A-PD precursor delivery system includes a temperature-controlled bath and gas manifold system with vent/run and dilution mass flow controllers, which provide accurate delivery of precursors to CVD processes.

Atomflo™ 400D System includes plasma applicator and controller.